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USHIO America Introduces U-eLektron

Published May 25, 2010
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USHIO America has introduced the U-eLektron E-beam System at the RadTech UV& EB Technology Expo and Conference. The U-eLektron, a bench top electron beam exposure system designed for R&D applications, is a 10 keV to 50 keV system withup to 200 μA of cathode current. The U-eLektron, which includes the electron beam gun, exposure chamber and controller/power supply, is priced starting at$17,000. An optional vacuum pump system is also available.

“Our U-eLektron E-beam System has been designed as a benchtop R&D system,” said Dr. Mark Viktor, general manager, technical products division, for Ushio America, Inc. “It is designed to be user-friendly and is ideal for proof of concept. It is also relatively inexpensive compared to other EB systems.”

Features and benefits of the the U-eLektron include a touchscreen control system, flexibility, and adjustable amperage and voltage. The acceleration potential at 10-50 keV is designed for R&D evaluation.

In addition, the user-friendly design allows for ease of operation, and it is easily maintained and serviced with replaceable window and filament.

The U-eLektron system is compact designed for bench scaled R&D operation and the low cost makes this system an affordable addition to labs of any size.

For more information visit USHIO on the web at

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