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Record Attendance at RadTech's e|5 Show



Published April 27, 2006
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Record numbers attended RadTech's biennial e|5: UV & EB Technology Expo & Conference, April 24-26 2006, at McCormick Place, Chicago, IL. 

"With rising energy costs, increasing international competition, and continuing environmental concerns, manufacturers are increasingly looking to ultraviolet (UV) and electron beam (EB) technology to address these challenges," said David Harbourne, RadTech president, and president of Fusion UV. "Our event highlighted this technology's tremendous enabling versatility, with a broad cross-section of manufacturers in attendance including firms engaged in the production of motor vehicles, food packaging, ink jet products, aerospace and defense, wood, metals, plastics and electronics."
 
"The aim of our event is to educate manufacturers about the operational benefits of UV and EB," said Mickey Fortune, director of e|5.  "At this event we recorded our highest number ever of UV/EB users and potential users seeking to learn the latest on the technology, with overall attendance at a record level reaching over 2,700."


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