JSR, imec Formalize JV for EUV Lithography Resist Solutions

JSR Corporation announced the signing of a joint venture (JV) agreement, which formalized the letter of intent (LOI) signed on May 12, 2015 between JSR’s wholly-owned subsidiary in Belgium, JSR Micro NV, and imec, enabling manufacturing and quality control of EUV lithography materials for the semiconductor industry. The new company, EUV Resist Manufacturing & Qualification Center NV (EUV RMQC), is incorporated with a majority of the total shares held by JSR Micro NV.
 
As EUV technology advances, the IC industry is putting pressure on materials suppliers and other vendors to prepare the manufacturing infrastructure and quality control capabilities required for taking EUV into high volume manufacturing.
 
“We understand the importance of EUV lithography for the future of advanced semiconductor manufacturing technologies,” said Bart Denturck, president of EUV RMQC and director and plant manager of JSR Micro NV. “EUV RMQC will provide two crucial roles for EUV lithography – superior, high-quality manufacturing capability and expertise and services for quality control with advanced tools.”
 
EUV lithography is considered as one of the main drivers to extend Moore’s law toward single digit nanometer technology nodes. imec and JSR’s collaboration will allow both companies to leverage their strengths when delivering photoresist solutions for the semiconductor industry to manufacture the devices.