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Can bring greater cost efficiency to manufacturers and reduce time necessary to bring a new device to market
February 18, 2011
By: DAVID SAVASTANO
Contributing Editor, Coatings World and Ink World
At SPIE Advanced Microlithography in San Jose, CA, Brewer Science will introduce lithographic technologies that can bring greater cost efficiency to manufacturers and reduce the time necessary to bring a new device to market. Brewer Science is pleased to present the following technologies during the SPIE poster session Tuesday, March 1: Novel Materials • Implementation of KrF DBARCs for implant applications on advanced lithography nodes (Paper 7972-78) • Tailorable BARC system to provide optimum solutions for various substrates in immersion lithography (Paper 7972-89) Manufacturing • Improving material-specific dispense processes for low-defect coatings (Paper 7972-108) • Understanding the role of DBARC in microbridging formation (Paper 7972-109) Dr. Douglas Guerrero, Ssenior technologist at Brewer Science, serves on the Program Committee for Advances in Resist Materials and Processing Technology XXVIII and is a session chair for Session 10 of Conference 7972, which will be held on Wednesday, March 2, from 1:30 p.m. to 3:30 p.m. and will focus on Novel Materials and Processing.
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