AIXTRON Delivers PRODOS Gen3.5 Production System to Major Asian Customer

AIXTRON SE announced the delivery of one PRODOS Gen3.5 Polymer Vapor Phase Deposition (PVPD) system based on AIXTRON’s proprietary Close Coupled Showerhead (CCS) technology to a major Asian customer. The production scale equipment will be dedicated to enabling the production of novel flexible electronic devices through the deposition of organic polymer thin films.

A local AIXTRON support team will install and commission the new deposition system at the customer’s premises within the next couple of weeks.

“Following the recent release of our new PRODOS-200 R&D platform, this new PRODOS Gen3.5 system has been designed to be a perfect match for our customer’s production environment for Gen3.5 substrates (650x750mm²),” Juergen Kreis, director of business development at AIXTRON, said. “While the R&D platform with its flexible configurations enables new processes to be developed on a conveniently-sized 200×200 mm² substrate, the PRODOS Gen3.5 shipped for this project implements a specific polymer deposition approach on an industrial scale. Incorporating carrier-gas enhanced deposition and Close Coupled Showerhead technologies, it is proof of the excellent scalability of the PVPD approach.”

“Having seen our PVPD systems being installed at other major players in flexible electronics and serving their sophisticated production processes for organic backplanes, we are delighted that AIXTRON’s key enabling technology has been chosen by this prestigious company,” Dr. Bernd Schulte, AIXTRON’s COO, added. “With flexible electronics still being at an early stage, the prospects for this novel technology are very promising and will allow our customer to develop new applications. These could include, for example, flexible flat panel displays with benefits such as lightweight, ruggedness, low power consumption, color brightness, and superior legibility.”

The AIXTRON Polymer Vapor Phase Deposition (PVPD) technology is a platform for controlled deposition and in-situ formation of polymer thin films from vapor phase. Unlike conventional solution-based polymer deposition methods, this “dry” deposition technology offers many unique advantages, such as control of layer properties, high contour conformity of the deposited layers, continuous change of polymer building blocks (i.e. controlled co-deposition) during the process, and efficient production work flows. The PVPD system enables the development of innovative materials technology and novel production methods in particular.