RadTech 2022 Opens Its Doors in Orlando on May 10
By David Savastano, Editor | 05.05.22
There will be eight concurrent sessions, including tracks on Structural and Flexible Electronics, Regulatory, Sustainability and more.
After the short courses today, the RadTech 2022 conference opens at the Hyatt Regency Orlando on Tuesday, May 10 with eight concurrent sessions, including Structural and Flexible Electronics, Cationic/Photoiniator, Regulatory, Sustainability and more.
The early morning sessions begin at 8 a.m., starting with three concurrent sessions: Structural and Flexible Electronics, Cationic/Photoiniator and Introduction to the Basics of UV/EB Curing.
Track 1A covers Structural and Flexible Electronics. Presentations will be given by Sage Schissel, PCT Ebeam and Integration and Zhijia Du, Oak Ridge National Laboratory; Jonathan Shaw, allnex USA Inc.; Donald Herr, Sartomer; and Christian Gorsche, Cubicure GmbH.
Cationic/Photoiniator, Track 1B, will offer presentations by David Engberg, Perstorp AB; Carlo Trentalange, Elixe srl; Julie Jessop, Mississippi State University; and Jonathan Andersson, Sartomer Inc.
Track 1C features Introduction to the Basics of UV/EB Curing, led by Dr. Mike Idacavage of Radical Curing, LLC.
After the break, the conference will have sessions on Regulatory, Chemical and Molecular Design and Equipment.
Regulatory, Track 2A, will feature presenters Shannon Gainey, Danimer Scientific; Jennifer Heathcote, GEW, Inc.; Natasha Banke, INX International Ink Company; and Gainey.
Track 2B, Chemical and Molecular Design, will be covered by a trio of speakers from the University of Iowa: Huayang Fang, University of Iowa; Alexandros Kotsiras, University of Iowa; and Tanner Grover, University of Iowa.
Track 2C examines new developments in Equipment. Presenters include Carlton Gibson, Seoul Viosys/SETi; Alessandro Condini, ELIXE SRL; and Miodrag Cekic, Heraeus Noblelight America LLC.
After lunch, the two concurrent sessions will be Sustainability and Measurement/Radiometry. Sustainability, Track 3A, will have talks by Brian Green, WaveFront Technology; Im Rangwalla, Energy Sciences Inc.; Sean Des Roches, RAHN USA Corp.; and Shannon Gainey, Danimer Scientific.
Track 3B, Measurement/Radiometry, will be covered Paul Snowwhite, 7D Innovators; Thomas Efsen, EFSEN UV & EB Technology; and David Ivarsson, EFSEN UV & EB Technology.
Track 3C is the New Product Debut, which will feature the following talks:
• a-Methylene-g-Butyrolactones Monomers Yielding High Tg, Optically Clear Polymers – Jonathan Kendall, Alkemere, LLC
• Latest Innovations in Photoacid Generator Technology – Mike Wyrostek, Hampford Research
• Alberdingk LUX 104 – A Robust, Amine-free UV PUD with Excellent Stability and Performance – Laurie Morris, Alberdingk Boley
• AeroLED, UV LED Made Simple – Jennifer Heathcote, GEW (EC)
• UV is a Process – How to Successfully Engage and Implement a UV Project – Michael Kelly, Allied PhotoChemical, Inc.
• VMOX – BASF’s new Reactive Diluent for UV Inks and 3D Printing – Dr. Raj Sundar, BASF Corporation
• A New Liquid Photoinitiator for LED Curing – Dr. Richard Plenderleith, Arkema-Sartomer Americas
• Allnex Wetting and Dispersing Radiation Curable Additive Developments. Ready to Use, Samples Available for Evaluation – Marco Bachler, allnex
The early morning sessions begin at 8 a.m., starting with three concurrent sessions: Structural and Flexible Electronics, Cationic/Photoiniator and Introduction to the Basics of UV/EB Curing.
Track 1A covers Structural and Flexible Electronics. Presentations will be given by Sage Schissel, PCT Ebeam and Integration and Zhijia Du, Oak Ridge National Laboratory; Jonathan Shaw, allnex USA Inc.; Donald Herr, Sartomer; and Christian Gorsche, Cubicure GmbH.
Cationic/Photoiniator, Track 1B, will offer presentations by David Engberg, Perstorp AB; Carlo Trentalange, Elixe srl; Julie Jessop, Mississippi State University; and Jonathan Andersson, Sartomer Inc.
Track 1C features Introduction to the Basics of UV/EB Curing, led by Dr. Mike Idacavage of Radical Curing, LLC.
After the break, the conference will have sessions on Regulatory, Chemical and Molecular Design and Equipment.
Regulatory, Track 2A, will feature presenters Shannon Gainey, Danimer Scientific; Jennifer Heathcote, GEW, Inc.; Natasha Banke, INX International Ink Company; and Gainey.
Track 2B, Chemical and Molecular Design, will be covered by a trio of speakers from the University of Iowa: Huayang Fang, University of Iowa; Alexandros Kotsiras, University of Iowa; and Tanner Grover, University of Iowa.
Track 2C examines new developments in Equipment. Presenters include Carlton Gibson, Seoul Viosys/SETi; Alessandro Condini, ELIXE SRL; and Miodrag Cekic, Heraeus Noblelight America LLC.
After lunch, the two concurrent sessions will be Sustainability and Measurement/Radiometry. Sustainability, Track 3A, will have talks by Brian Green, WaveFront Technology; Im Rangwalla, Energy Sciences Inc.; Sean Des Roches, RAHN USA Corp.; and Shannon Gainey, Danimer Scientific.
Track 3B, Measurement/Radiometry, will be covered Paul Snowwhite, 7D Innovators; Thomas Efsen, EFSEN UV & EB Technology; and David Ivarsson, EFSEN UV & EB Technology.
Track 3C is the New Product Debut, which will feature the following talks:
• a-Methylene-g-Butyrolactones Monomers Yielding High Tg, Optically Clear Polymers – Jonathan Kendall, Alkemere, LLC
• Latest Innovations in Photoacid Generator Technology – Mike Wyrostek, Hampford Research
• Alberdingk LUX 104 – A Robust, Amine-free UV PUD with Excellent Stability and Performance – Laurie Morris, Alberdingk Boley
• AeroLED, UV LED Made Simple – Jennifer Heathcote, GEW (EC)
• UV is a Process – How to Successfully Engage and Implement a UV Project – Michael Kelly, Allied PhotoChemical, Inc.
• VMOX – BASF’s new Reactive Diluent for UV Inks and 3D Printing – Dr. Raj Sundar, BASF Corporation
• A New Liquid Photoinitiator for LED Curing – Dr. Richard Plenderleith, Arkema-Sartomer Americas
• Allnex Wetting and Dispersing Radiation Curable Additive Developments. Ready to Use, Samples Available for Evaluation – Marco Bachler, allnex
